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Title: Magnetic properties and thermal stability of Fe-Zr-N/Si-N and Fe-Ta-N/Si-N multilayer film (abstract)

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.349963· OSTI ID:5191658
 [1];  [2]
  1. Tokyo Institute of Polytechnics, Atsugi-shi, Kanagawaken 243-02 (Japan)
  2. Tokyo Institute of Technology, Meguro-ku, Tokyo 152 (Japan)

It has been shown that Fe-N/Si-N multilayer films has excellent soft magnetic properties, but their properties are deteriorated easily by increasing the temperature above 400 {degree}C.{sup 1} In this study, we added a small amount of Zr and Ta to the Fe-N layer to improve their thermal stability of the soft magnetic properties. Multilayer films about 3000 A thick were deposited by an opposed target sputtering apparatus on glass slide substrates. Thickness of the Si-N layer was fixed at 50 A, while those of the Fe-Zr-N (or Fe-Ta-N) layer {ital T}{sub Fe-N} was changed in the range from 200 to 1000 A. For control of the film composition, a composite target was used. The area ratio of the Zr (or Ta) plate to total target area was changed in the range 0{similar to}4.8%. Figure 1 shows the changes in coercivity {ital H}{sub {ital c}} and saturation magnetization {ital M}{sub {ital s}} of the Fe-Zr-N/Si-N film with annealing temperature. The changes in x-ray diffraction patterns of these films are shown in Fig. 2. It is evident from these figures that the crystal growth in the films obtained by the sputtering of 4.8%: Zr-Fe target is significantly suppressed, though the film obtained by the sputtering of 3.2%: Zr is crystallized at a temperature below 400 {degree}C. Soft magnetic properties of the 4.8%: Zr film are not deteriorated by the annealing at the temperature up to 550 {degree}C. Saturation magnetization has a tendency to increase as the annealing temperature increases. Similar results are obtained in the addition of Ta.

OSTI ID:
5191658
Journal Information:
Journal of Applied Physics; (United States), Vol. 70:10; ISSN 0021-8979
Country of Publication:
United States
Language:
English