Thermal stability of Mo/Si multilayers

Conference · Mon Jul 01 00:00:00 EDT 1991

OSTI ID:5112253

Rosen, R S; Stearns, D G ^[1]; Viliardos, M A; Kassner, M E ^[2]; Vernon, S P ^[3]

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1. Lawrence Livermore National Lab., CA (United States)
2. Oregon State Univ., Corvallis, OR (United States). Dept. of Mechanical Engineering
3. Vernon Applied Physics, Torrance, CA (United States)

The thermal stability of Mo/Si multilayers for x-ray mirror applications was investigated by annealing studies at relatively low temperatures for various times. The as-deposited and annealed multilayers were examined using conventional small and large angle x-ray diffraction, normal incidence x-ray reflectance measurements using a synchrotron source, selected area electron diffraction, and high-resolution electron microscopy. The as-deposited structure consists of pure layers of crystalline Mo and amorphous Si separated by thin regions of amorphous Mo-Si. At temperatures between 200--400{degrees}C, the amorphous Mo-Si interlayers grow and hexagonal MoSi{sub 2} forms by a thermally activated process(es), and the bilayer spacing and x-ray reflectivity decrease. A determination of the effective activation energy of the process(es) suggests long-term stability at the mirror operating temperature, although additional low temperature testing is warranted. 11 refs., 5 figs., 2 tabs.

• Research Organization: Lawrence Livermore National Lab., CA (United States)
• Sponsoring Organization: USDOE; USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 5112253
• Report Number(s): UCRL-JC-108310; CONF-9107115-53; ON: DE92001897
• Resource Relation: Conference: Society of Photo-Optical Instrumentation Engineers (SPIE) meeting, San Diego, CA (United States), 21-26 Jul 1991
• Country of Publication: United States
• Language: English

Related Subjects

47 OTHER INSTRUMENTATION
MOLYBDENUM
LAYERS
REFLECTIVE COATINGS
ANNEALING
SILICON
VAPOR DEPOSITED COATINGS
REFLECTIVITY
X-RAY EQUIPMENT
MIRRORS
SPUTTERING
COATINGS
ELEMENTS
EQUIPMENT
HEAT TREATMENTS
METALS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
SEMIMETALS
SURFACE PROPERTIES
TRANSITION ELEMENTS
440600* - Optical Instrumentation- (1990-)