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Title: Nuclear track formation and track applications at GSI Darmstadt

Conference · · Nucl. Sci. Appl.; (United States)
OSTI ID:5032887
 [1]
  1. Gesellschaft fuer Schwerionenforschung m.b.H., Darmstadt (Germany, F.R.)

Heavy ion tracks in dielectric materials can be chemically 'amplified' by an etching process that transforms the latent tracks into extremely fine channels. Etched track diameters start around 10 nm and increase linearly with the etching time. In contrast to all other techniques, a single particle is sufficient to create a developable damage. This opens the way for a single-particle structuring tool with a wide range of applications.

OSTI ID:
5032887
Report Number(s):
CONF-8205258-
Journal Information:
Nucl. Sci. Appl.; (United States), Vol. 1:6; Conference: Non-nuclear physics meeting, Caen, France, 24 May 1982
Country of Publication:
United States
Language:
English