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Title: Giant magnetoresistance phenomenon in laser ablated La{sub 0.6}Y{sub 0.07}Ca{sub 0.33}MnO{sub x} thin films

Book ·
OSTI ID:490847
; ;  [1];  [2]
  1. North Carolina State Univ., Raleigh, NC (United States). Dept. of Materials Science and Engineering
  2. Oak Ridge National Lab., TN (United States). Solid State Div.

Microstructural and magnetoresistance properties of La{sub 0.6}Y{sub 0.07}Ca{sub 0.33}MnO{sub x} (Y-doped LCMO) thin films grown in-situ by pulsed laser ablation have been studied. Transmission electron microscopy and x-ray diffraction measurements have shown that the Y-doped LCMO thin films grow epitaxially on (100) LaAlO{sub 3} substrates and are cubic with a lattice parameter of 3.849 {angstrom}. The as-deposited films exhibited a metal-insulator transition at 130 K and a giant magnetoresistance (GMR) at 125 K with a MR ratio (dR/R{sub H}) of 1,500% in the presence of a magnetic field of 6 Tesla. Such a colossal value of MR ratio for as-deposited Y-doped LCMO films is quite promising keeping in view the fact that these films were unannealed and not optimized. The authors ascribe this magnetoresistance to spin-dependent electron scattering coupled with the presence of intervening O{sup 2{minus}} ions across Mn{sup 3+} and Mn{sup 4+} with suppressed separation between Mn-O layers caused by smaller sized Y-dopant. The effect of annealing on the positive-shift of metal-insulator transition temperature and the improvement in GMR ratio has also been discussed. The authors report a non-ohmic response in the Y-doped LCMO films which is observed only in the region of the resistance peak and lends support to a conduction mechanism in these materials based on spin-dependent scattering of electrons.

OSTI ID:
490847
Report Number(s):
CONF-951155-; ISBN 1-55899-300-2; TRN: 97:011773
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Advanced laser processing of materials -- Fundamentals and applications; Singh, R. [ed.] [Univ. of Florida, Gainesville, FL (United States)]; Norton, D. [ed.] [Oak Ridge National Lab., TN (United States)]; Laude, L. [ed.] [Univ. of Mons-Hainaut, Mons (Belgium)]; Narayan, J. [ed.] [North Carolina State Univ., Raleigh, NC (United States)]; Cheung, J. [ed.] [Rockwell International Science Center, Thousand Oaks, CA (United States)]; PB: 693 p.; Materials Research Society symposium proceedings, Volume 397
Country of Publication:
United States
Language:
English