Characterization of the mechanical and tribological properties of sputtered a:SiC thin films
- Univ. of Alabama, Tuscaloosa, AL (United States). Dept. of Metallurgical and Materials Engineering
D.C. magnetron sputtering from a CVD {beta}-SiC target has been utilized to deposit amorphous SiC thin films on various substrates (Corning 7059 glass, unoxidized Si (111), and sapphire). The approximately 1 {micro}m thick films were grown under various Ar sputtering pressures and flow rates. In situ annealing during deposition in vacuum and ex situ post-deposition annealing in air, both at 500 C for two hours, were implemented to determine their effects on the properties of the films. The mechanical properties were assessed via nanoindentation. An accelerated sphere-on-flat(tape) wear tester was administered to measure the wear volume losses and resultant wear rates under 0.1 and 0.2N loads, a 0.024 m/s tape speed, and a 1 mm ruby sphere diameter. An atomic force microscope (AFM) established the wear scar volume losses as well as the surface arithmetic roughness (R{sub A}) and root mean square roughness (RMS) of the films. The amorphous microstructure was verified by X-ray diffractometry. There was a decreasing trend in the plastic contact damage resistance, hardness, elastic modulus, and wear resistance of the films with increased amounts of Ar gas pressure; on the other hand, annealing of the lower Ar content films generated an increase in these properties compared to the as-deposited films. Atomic force microscopy revealed a more pronounced change in surface features and roughness for the in situ annealed films.
- Sponsoring Organization:
- National Science Foundation, Washington, DC (United States)
- OSTI ID:
- 467615
- Report Number(s):
- CONF-960401-; ISBN 1-55899-339-8; TRN: IM9721%%43
- Resource Relation:
- Conference: Spring meeting of the Materials Research Society (MRS), San Francisco, CA (United States), 8-12 Apr 1996; Other Information: PBD: 1997; Related Information: Is Part Of Thin films: Stresses and mechanical properties VI; Gerberich, W.W. [ed.] [Univ. of Minnesota, Minneapolis, MN (United States)]; Gao, H. [ed.] [Stanford Univ., CA (United States)]; Sundgren, J.E. [ed.] [Linkoeping Univ. (Sweden)]; Baker, S.P. [ed.] [Max-Planck-Inst. fuer Metallforschung, Stuttgart (Germany)]; PB: 559 p.; Materials Research Society symposium proceedings, Volume 436
- Country of Publication:
- United States
- Language:
- English
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