skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: High resolution interface nanochemistry and structure: Final project report, December 1, 1993--February 28, 1997

Technical Report ·
DOI:https://doi.org/10.2172/465857· OSTI ID:465857

Work includes studies of interface and grain boundary chemistry and structure in silicon nitride matrix/silicon carbide whisker composites, and in monolithic silicon nitride and silicon carbide synthesized by several different methods. Off-stoichiometric, impurity, and sintering aid elemental distributions in these materials (and other ceramics) have been of great interest because of expected effects on properties but these distributions have proven very difficult to measure because the spatial resolution required is high. The authors made a number of these measurements for the first time, using techniques and instrumentation developed here. Interfaces between metals and SiC are the basis for important metal matrix composites and contacts for high temperature SiC-based solid state electronic devices. The authors have investigated ultrapure interfaces between Ti, Hf, Ti-Hf alloys, Pt, and Co and Si-terminated (0001) 6H SiC single crystals for the first time.

Research Organization:
Arizona State Univ., Tempe, AZ (United States)
Sponsoring Organization:
USDOE Office of Energy Research, Washington, DC (United States)
DOE Contract Number:
FG03-94ER45510
OSTI ID:
465857
Report Number(s):
DOE/ER/45510-T2; ON: DE97004865; TRN: 97:002727
Resource Relation:
Other Information: PBD: 27 Feb 1997
Country of Publication:
United States
Language:
English

Similar Records

High resolution interface nanochemistry and structure. Progress report, December 1, 1994--November 30, 1995
Technical Report · Tue Aug 15 00:00:00 EDT 1995 · OSTI ID:465857

Gas source molecular beam epitaxy of scandium nitride on silicon carbide and gallium nitride surfaces
Journal Article · Sat Nov 01 00:00:00 EDT 2014 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:465857

Hydrogen desorption from hydrogen fluoride and remote hydrogen plasma cleaned silicon carbide (0001) surfaces
Journal Article · Tue Sep 15 00:00:00 EDT 2015 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:465857