Kinetics and radiative processes in Xe/I{sub 2} inductively coupled rf discharges at low pressure
- Univ. of Illinois, Urbana, IL (United States). Dept. of Electrical and Computer Engineering
The environmental concern over the presence of mercury in conventional fluorescent lamps has motivated research into alternative electrically efficient near UV plasma lighting sources. One such candidate is multi-wavelength UV emission from Xe/I{sub 2} mixtures, including excimer radiation from XeI at 253 nm. Previous studies of the XeI system were performed at high pressures and were intended for laser applications. Practical Xe/I{sub 2} lamps will likely operate in the 0.5--10 torr regime and use electrodeless excitation to avoid issues related to electrode erosion by the halogen. In this paper, the authors report on an experimental investigation of low pressure, inductively coupled plasmas sustained in Xe/I{sub 2} mixtures. The goals of this work are to characterize the UV emission and determine excitation mechanisms in a parameter space of interest to lighting applications.
- OSTI ID:
- 435475
- Report Number(s):
- CONF-960634-; TRN: IM9710%%133
- Resource Relation:
- Conference: 1996 IEEE international conference on plasma science, Boston, MA (United States), 3-5 Jun 1996; Other Information: PBD: 1996; Related Information: Is Part Of IEEE conference record -- Abstracts: 1996 IEEE international conference on plasma science; PB: 324 p.
- Country of Publication:
- United States
- Language:
- English
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