Accurate estimation of radiative and convective losses in a multizone RTP reactor
- Univ. of Florida, Gainesville, FL (United States). Dept. of Materials Science and Engineering
- Micron Semiconductor, Boise, ID (United States)
The authors have developed a methodology aimed at accurately determining the various forms of energy transfer (convective loss, radiative loss and absorption of lamp energy by the wafer) occurring in any advanced RTP system, based on basic system identification experiments and simple 3-dimensional physical model depicting the heat transfer processes. The identification experiments help in estimating the uncertain system dependent factors which characterize the various forms of energy transfer, which may be otherwise difficult to calculate on pure theoretical basis. This methodology forms the basic building block of the effort to develop a tool which can predict the temperature distribution across the wafer in a realistic way. This tool can be used both as a wafer temperature control algorithm in any advanced RTP system by incorporating more accurate system impedance parameters (convective and radiative loss) as well as by an end user to calculate the required power level settings to various lamp zones to attain reasonable temperature uniformity for a RTP system which does not have a dynamic control.
- OSTI ID:
- 400660
- Report Number(s):
- CONF-960401-; ISBN 1-55899-332-0; TRN: IM9650%%65
- Resource Relation:
- Conference: Spring meeting of the Materials Research Society (MRS), San Francisco, CA (United States), 8-12 Apr 1996; Other Information: PBD: 1996; Related Information: Is Part Of Rapid thermal and integrated processing 5; Gelpey, J.C. [ed.] [AST Elektronik USA, Inc., Lynnfield, MA (United States)]; Oeztuerk, M.C. [ed.] [North Carolina State Univ., Raleigh, NC (United States)]; Thakur, R.P.S. [ed.] [Micron Technology, Inc., Boise, ID (United States)]; Fiory, A.T. [ed.] [Bell Labs., Murray Hill, NJ (United States). Lucent Technology]; Roozeboom, F. [ed.] [Philips Research, Eindhoven (Netherlands)]; PB: 400 p.; Materials Research Society symposium proceedings, Volume 429
- Country of Publication:
- United States
- Language:
- English
Similar Records
Integrated thermal analysis of natural convection air cooled electronic enclosure
Emissivity independent process control in a short wavelength arc lamp RTP chamber