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Title: Homo and heteroepitaxial growth of LiTaO{sub 3} and LiNbO{sub 3} by MBE

Conference ·
OSTI ID:392168
;  [1]; ;  [2]
  1. North Carolina State Univ., Raleigh, NC (United States). Dept. of Materials Science and Engineering
  2. ETH Zuerich (Switzerland)

Thin films and superlattices of LiTaO{sub 3} and LiNbO{sub 3} were grown on (0001) LiTaO{sub 3} and LiNbO{sub 3} wafers by molecular beam epitaxy. Solid sources were employed for the evaporation of Li, Ta, and Nb while oxygen was activated in an ECR plasma source. Samples were completely oxidized during the growth as confirmed by quantitative surface analyses. Crystalline films were obtained on both substrates at a growth rate of 0.1 nm/s and substrate temperature of 900 C. Films were c-axis oriented but showed in-plane 60{degree} rotational domains. Superlattice structure with a bilayer period of 10 nm was grown on LiNbO{sub 3}. It showed well defined interfaces and appeared to be strained.

OSTI ID:
392168
Report Number(s):
CONF-951155-; ISBN 1-55899-304-5; TRN: 96:028528
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Epitaxial oxide thin films 2; Speck, J.S. [ed.] [Univ. of California, Santa Barbara, CA (United States)]; Fork, D.K. [ed.] [Xerox Palo Alto Research Center, CA (United States)]; Wolf, R.M. [ed.] [Philips Research Labs., Briarcliff Manor, NY (United States)]; Shiosaki, Tadashi [ed.] [Kyoto Univ. (Japan)]; PB: 577 p.; Materials Research Society symposium proceedings, Volume 401
Country of Publication:
United States
Language:
English