Evaluation of boron-doped beryllium as an ablator for NIF target capsules
- Lawrence Livermore National Lab., CA (United States)
The authors are studying the feasibility of using boron doping to refine the grain structure of sputter-deposited Be for NIF ignition capsule ablators. The goal is to improve the surface finish and homogeneity of these coatings. Films deposited on flat silicon substrates display a pronounced change in structure at a concentration of {approximately}11 at.% B. At lower levels of B, grain sizes of about 100 nm are observed. AFM images show the roughness of these films to be about 20 nm rms. Films deposited on capsules do not show the same behavior. In particular, at 15 at.% B, the capsule coatings have nodular structure with an rms roughness of greater than 50 nm. When viewed in cross section, however, no structure is seen with either the flat films or the capsule coatings. They believe that differences in substrate temperature may be largely responsible for the observed behavior.
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 328356
- Journal Information:
- Fusion Technology, Vol. 35, Issue 2; Other Information: PBD: Mar 1999
- Country of Publication:
- United States
- Language:
- English
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