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Title: Mechanical and tribological properties of a-GeC{sub x} films deposited by dc-magnetron sputtering

Book ·
OSTI ID:305532
; ;  [1]; ; ;  [2]; ;  [3]
  1. PUC-Rio, Rio de Janeiro, RJ (Brazil). Dept. de Fisica
  2. CBPF, Rio de Janeiro, RJ (Brazil)
  3. UFPR, Curitiba (Brazil). Dept. de Fisica

Amorphous carbon-germanium films were grown by dc-magnetron sputtering at different argon plasma pressures ranging from 0.17 and 1.4 Pa. The water-cooled sample holder was grounded. The film thickness were typically 0.5 {micro}m. The ratio between germanium and carbon atomic concentration ranges up to 2.8, as measured by Rutherford backscattering spectrometry (RBS). Elastic recoil detection technique was used to measure hydrogen contamination. The film hardness was measured by nanoindentation techniques and the internal stress was determined by the bending of the substrate. The incorporation of Ge reduces both the film hardness and the internal stress. Hardness and internal stress increases when the films are deposited in lower pressures. Atomic Force Microscopy (AFM) was used to measure the surface roughness, which was found to be insensitive to the pressure and to the Ge content. A possible influence of the thickness on the morphology of pure carbon films is discussed. The friction coefficient measured by AFM is independent on the film composition within experimental errors.

OSTI ID:
305532
Report Number(s):
CONF-971201-; TRN: IM9906%%212
Resource Relation:
Conference: 1997 fall meeting of the Materials Research Society, Boston, MA (United States), 1-5 Dec 1997; Other Information: PBD: 1998; Related Information: Is Part Of Thin-films -- Stresses and mechanical properties 7; Cammarata, R.C. [ed.] [Naval Research Lab., Washington, DC (United States)]; Nastasi, M. [ed.] [Los Alamos National Lab., NM (United States)]; Busso, E.P. [ed.] [Univ. of London (United Kingdom). Imperial Coll.]; Oliver, W.C. [ed.] [Nano Instruments, Inc., Oak Ridge, TN (United States)]; PB: 663 p.; Materials Research Society symposium proceedings, Volume 505
Country of Publication:
United States
Language:
English