Epitaxial Fe{sub 16}N{sub 2} films grown on Si(001) by reactive sputtering
- Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
- IBM Research Division, Almaden Research Center, San Jose, California 95120 (United States)
We present a crystallographic template for the growth of the range of Fe-N phases on Si(001) by lattice matching on selected underlayers. Epitaxial films of pure {alpha}-Fe, {gamma}{prime}-Fe{sub 4}N, and {alpha}{prime}-Fe{sub 8}N (N martensite) were grown individually by the optimization of reactive N{sub 2} sputtering parameters. The orientation relation of the Fe-N phases was Fe-N(001){parallel}Ag(001){parallel}Si(001) and Fe-N[100]{parallel}Ag[110]{parallel}Si[100]. Annealing the {alpha}{prime}-Fe{sub 8}N films resulted in the formation of {alpha}{prime}-Fe{sub 8}N/{alpha}{double_prime}-Fe{sub 16}N{sub 2} mixtures. In addition to the crystallographic and structural analysis, quantification of x-ray diffraction peak intensities confirmed that the {alpha}{prime}/{alpha}{double_prime} mixtures contained as much as 46 vol{percent} {alpha}{double_prime} (remaining {alpha}{prime}). Vibrating sample magnetometry and SQUID magnetometry measurements of the {alpha}{prime} and {alpha}{prime}(54{percent})/{alpha}{double_prime}(46{percent}) mixture, respectively, indicate enhanced magnetic moments for both the {alpha}{prime} and {alpha}{double_prime} phases with respect to pure Fe. {copyright} {ital 1996 American Institute of Physics.}
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 280047
- Report Number(s):
- CONF-951101-; ISSN 0021-8979; TRN: 9608M0102
- Journal Information:
- Journal of Applied Physics, Vol. 79, Issue 8; Conference: 40. conference on magnetism and magnetic materials, Philadelphia, PA (United States), 6-9 Nov 1995; Other Information: PBD: Apr 1996
- Country of Publication:
- United States
- Language:
- English
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