The Growth of InAs{sub x}Sb{sub 1 –x} Solid Solutions on Misoriented GaAs(001) Substrates by Molecular-Beam Epitaxy
- Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences (Russian Federation)
The effect of a substrate misorientation degree from a singular face on the composition and morphology of layers of InAs{sub x}Sb{sub 1 –x} solid solutions obtained by molecular-beam epitaxy on a GaAs surface has been investigated. The substrates of GaAs wafers with the orientation (100) misoriented in the direction [110] by 0°, 1°, 2°, and 5° are used. The heterostructures are grown at temperatures of 310°C and 380°C (respectively, the lower and upper boundaries of the temperature range in which structurally perfect InAs{sub x}Sb{sub 1 –x} films form). The effect of the molecular form of arsenic (As{sub 2} or As{sub 4}) on the composition of the layers is studied. The composition and structural properties are investigated using high-resolution X-ray diffractometry (HRXRD) and atomic-force microscopy (AFM). It is established that, in the series of misorientation angles 0° → 5°, the arsenic fraction x increases consecutively when using fluxes of both As{sub 2} and As{sub 4} molecules. With the As{sub 2} molecular flux, the fraction x increases only a little (1.05 times) with increasing degree of misorientation, while, when using the As{sub 4} flux, the increase in x is 1.75 times. An increase in the growth temperature leads to growth in the arsenic fraction in the solid solution. The surface morphology improves with an increasing degree of misorientation at a low growth temperature and degrades at a high temperature.
- OSTI ID:
- 22945028
- Journal Information:
- Semiconductors, Vol. 53, Issue 4; Other Information: Copyright (c) 2019 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
- Country of Publication:
- United States
- Language:
- English
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