Effect of Oxygen Flow Rate on Structural, Electrical and Optical Properties of Zinc Aluminum Oxide Thin Films Deposited by DC Magnetron Sputtering

Journal Article · Mon Apr 15 00:00:00 EDT 2019 · Semiconductors (Woodbury, N.Y., Print)

DOI:https://doi.org/10.1134/S106378261904016X· OSTI ID:22945022

Hymavathi, B. ^[1]

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1. Department of Physics, Anil Neerukonda Institute of Technology and Sciences (Autonomous) (India)

Zinc Aluminum Oxide thin films were deposited on glass substrates by reactive DC magnetron sputtering method by varying oxygen flow rates from 1 to 4 sccm. Glancing angle X-ray diffraction patterns ofzinc aluminum oxide thin films exhibits (0 0 2) peak with c-plane preferentially oriented parallel to the substrate. The surface morphology and elemental analysis of the films was observed by field emission scanning electron microscopy attached with energy dispersive X-ray analysis spectroscopy. An average optical transmittance of 83–90% is obtained for the films deposited at various oxygen flow rates. The optical band gap of the films increases from 3.41 to 3.53 eV with the increase of oxygen flow rate due to Burstein–Moss effect. The optical dispersion parameters such as dispersion energy (E{sub d}), oscillator energy (E{sub o}) and static refractive index (n{sub o}) were determined using the Wemple-DiDomenico (W-D) single oscillator model. The nonlinear optical parameters such as optical susceptibility (χ{sup (1)}), third order nonlinear optical susceptibility (χ{sup (3)}) and nonlinear refractive index (n{sub 2}) were also determined.

• OSTI ID: 22945022
• Journal Information: Semiconductors (Woodbury, N.Y., Print), Vol. 53, Issue 4; Other Information: Copyright (c) 2019 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM OXIDES
DEPOSITS
FIELD EMISSION
FLOW RATE
GLASS
MAGNETRONS
MORPHOLOGY
NONLINEAR PROBLEMS
OPTICAL DISPERSION
OSCILLATORS
OXYGEN
REFRACTIVE INDEX
SCANNING ELECTRON MICROSCOPY
SPUTTERING
THIN FILMS
X-RAY DIFFRACTION
X-RAY SPECTROSCOPY
ZINC OXIDES