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Title: Impact of MgO thickness on the perpendicular magnetic anisotropy of Mo/Co2FeAl/MgO/Mo multilayers with improved annealing stability

Journal Article · · Materials Research Bulletin
 [1];  [2];  [3]; ;
  1. Nanotechnology Research Centre, SRM Institute of Science and Technology, Kattankulathur 603 203, Tamil Nadu (India)
  2. Advanced Magnetics Group, Defence Metallurgical Research Laboratory, Hyderabad 500 058 (India)
  3. International Advanced Research Centre for Powder Metallurgy and New Materials, Chennai 600113 (India)

Highlights: • Robust PMA is demonstrated for thermally stable Mo/Co{sub 2}FeAl(CFA)/MgO/Mo multilayer. • Thickness of CFA and MgO over-layer plays a main role in achieving the strong PMA. • Significant PMA energy of K{sub eff} ≈ 1.67 × 10{sup 6} erg/cm{sup 3} is achieved for film annealed at 400 °C. • Co and/or Fe – 3d{sub Z}{sup 2} and O-2P{sub Z} orbital hybridization at interface is the origin for PMA. - Abstract: In this study, an interfacial perpendicular magnetic anisotropy (PMA) is achieved in Mo/Co{sub 2}FeAl (CFA)/MgO/Mo multilayer with good thermal stability up to 400 °C by tuning the annealing temperature and film thickness of CFA and MgO. For an optimized CFA film thickness (1.0 nm) and annealing temperature (400 °C), the CFA/MgO interface plays a main role in achieving the strong PMA property when the MgO film thickness was tuned from 0.5 nm to 2.0 nm. The effective perpendicular magnetic anisotropy energy density (K{sub eff}) is approximately 1.67 × 10{sup 6} erg/cc when t{sub MgO} = 2 nm. Surface morphology and surface roughness changes in the films are investigated by atomic force microscopy (AFM). An enhancement in surface smoothness is observed for the annealed films. X-ray photoelectron spectroscopy (XPS) reveals that the strong PMA in Mo/CFA/MgO is originated from the adequate oxidation of Co and Fe at CFA/MgO interface.

OSTI ID:
22805294
Journal Information:
Materials Research Bulletin, Vol. 107; Other Information: Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
Country of Publication:
United States
Language:
English