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Title: Formation of a hybrid plasmonic waveguide mode probed by dispersion measurement

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4916800· OSTI ID:22399375
 [1]
  1. Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011 (Japan)

Hybrid waveguides, i.e., dielectric waveguides combined with plasmonic waveguides, have great potential for concomitantly exhibiting subwavelength confinement and long range propagation, enabling a highly integrated photonic circuit. We report the characterization of hybrid waveguide modes excited in Si/SiO{sub 2}/Al films, by dispersion measurement using angle-resolved electron energy-loss spectroscopy. This experiment directly verifies the formation of the hybrid waveguide mode with a strongly localized electromagnetic field in a 6-nm-thick SiO{sub 2} layer. The results clearly describe the characteristic behavior of the hybrid waveguide mode, which depends on the effective index of the constituent dielectric waveguide and the surface plasmon-polariton modes.

OSTI ID:
22399375
Journal Information:
Journal of Applied Physics, Vol. 117, Issue 13; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English