Reduced threading dislocation densities in high-T/N-rich grown InN films by plasma-assisted molecular beam epitaxy
- Walter Schottky Institut and Physik Department, Technische Universitaet Muenchen, Garching 85748 (Germany)
We explore the effect of growth kinetics on the structural properties of In-polar InN films on GaN templates grown near the thermal dissociation limit by plasma-assisted molecular beam epitaxy. Unlike the common growth temperature limit (T Almost-Equal-To 500 Degree-Sign C) for In-polar InN grown under In-rich conditions, slightly N-rich conditions are demonstrated to shift the available growth temperature window to much higher temperatures (by >50 Degree-Sign C). InN films grown in this high-T/N-rich regime show significantly reduced off-axis X-ray diffraction rocking curve peak widths and record low threading dislocation densities (TDD {approx} 4 Multiplication-Sign 10{sup 9} cm{sup -2}) even for film thicknesses <1 {mu}m, as compared to state of the art In-rich growth. The reduction of TDD is attributed to more effective TD inclination and annihilation under N-rich growth, delineating prospective routes for improved InN-based materials.
- OSTI ID:
- 22162723
- Journal Information:
- Applied Physics Letters, Vol. 102, Issue 5; Other Information: (c) 2013 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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