Synthesis of oxidation resistant lead nanoparticle films by modified pulsed laser ablation

Journal Article · Mon Jul 30 00:00:00 EDT 2012 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.4739873· OSTI ID:22069142

Shin, Eunsung; Murray, P Terrence; Subramanyam, Guru; Malik, Hans K; Schwartz, Kenneth L ^[1]

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1. Research Institute, University of Dayton, Dayton, OH 45469-0170 (United States)

Thin layers of lead nanoparticles have been produced by a modified pulsed laser ablation (PLA) process in which smaller nanoparticles were swept out of the ablation chamber by a stream of flowing Ar. Large ({mu}m-sized) particles, which are usually deposited during the standard PLA process, were successfully eliminated from the deposit. The nanoparticles deposited on room temperature substrates were well distributed, and the most probable particle diameter was in the order of 30 nm. Since lead is highly reactive, the nanoparticles formed in Ar were quickly oxidized upon exposure to air. A small partial pressure of H{sub 2}S gas was subsequently added to the effluent, downstream from the ablation chamber, and this resulted in the formation of nanoparticle deposits that were surprisingly oxidation resistant. The properties of the nanoparticle films (as determined by transmission electron microscopy, scanning electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, and conductivity measurements) are reported, and the mechanism of the oxidation retardation process is discussed.

• OSTI ID: 22069142
• Journal Information: AIP Conference Proceedings, Vol. 1464, Issue 1; Conference: International symposium on high power laser ablation 2012, Santa Fe, NM (United States), 30 Apr - 3 May 2012; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
77 NANOSCIENCE AND NANOTECHNOLOGY
ABLATION
ENERGY BEAM DEPOSITION
FABRICATION
LASER RADIATION
LEAD
NANOSTRUCTURES
OXIDATION
PARTIAL PRESSURE
PARTICLES
PULSED IRRADIATION
SCANNING ELECTRON MICROSCOPY
SUBSTRATES
SYNTHESIS
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY
X-RAY DIFFRACTION
X-RAY PHOTOELECTRON SPECTROSCOPY