Process-structure-property correlations in pulsed dc reactive magnetron sputtered vanadium oxide thin films

Journal Article · Tue Nov 15 00:00:00 EST 2011 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.3636372· OSTI ID:22054121

Venkatasubramanian, Chandrasekaran; Cabarcos, Orlando M; Drawl, William R; Allara, David L; Ashok, S; Horn, Mark W; Bharadwaja, S S. N. ^[1]

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1. Department of Engineering Sciences and Mechanics, Pennsylvania State University, University Park, Pennsylvania 16802 (United States)

Cathode hysteresis in the reactive pulsed dc sputtering of a vanadium metal target was investigated to correlate the structural and electrical properties of the resultant vanadium oxide thin films within the framework of Berg's model [Berg et al., J. Vac. Sci. Technol. A 5, 202 (1987)]. The process hysteresis during reactive pulsed dc sputtering of a vanadium metal target was monitored by measuring the cathode (target) current under different total gas flow rates and oxygen-to-argon ratios for a power density of {approx}6.6.W/cm{sup 2}. Approximately 20%-25% hysteretic change in the cathode current was noticed between the metallic and oxidized states of the V-metal target. The extent of the hysteresis varied with changes in the mass flow of oxygen as predicted by Berg's model. The corresponding microstructure of the films changed from columnar to equiaxed grain structure with increased oxygen flow rates. Micro-Raman spectroscopy indicates subtle changes in the film structure as a function of processing conditions. The resistivity, temperature coefficient of resistance, and charge transport mechanism, obeying the Meyer-Neldel relation [Meyer and Neldel, Z. Tech. Phys. (Leipzig) 12, 588 (1937)], were correlated with the cathode current hysteric behavior.

• OSTI ID: 22054121
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 29, Issue 6; Other Information: (c) 2011 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ARGON
CATHODES
CHARGE TRANSPORT
CRYSTAL STRUCTURE
CURRENTS
ELECTRIC CONDUCTIVITY
FLOW RATE
GAS FLOW
HYSTERESIS
MAGNETRONS
MICROSTRUCTURE
OXYGEN
POWER DENSITY
RAMAN SPECTROSCOPY
SPUTTERING
THIN FILMS
VANADIUM
VANADIUM OXIDES