Unravelling the atomic mechanisms of tetrahedral doping in chalcogenide glass for electrical switching materials
Journal Article
·
· Journal of Materials Chemistry C
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan 430074, China, Hubei Yangtze Memory Laboratories, Wuhan 430205, China
- Department of Electrical and Electronic Engineering, the University of Hong Kong, Hong Kong, China
- School of Mathematics and Physics, Nanyang Institute of Technology, Nanyang 473004, China
- Ames Laboratory, U. S. Department of Energy and Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011, USA
- Shanghai Ultra-Precision Optical Manufacturing Engineering Center and Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China
This study highlights the crucial role of Si doping in OTS materials by revealing the atomic mechanisms of Si doping that result in high thermal stability, enhanced endurance, and reduced V th drift in a-GeSiSe materials for ovonic threshold switching (OTS) through first-principles calculations.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 2203957
- Journal Information:
- Journal of Materials Chemistry C, Journal Name: Journal of Materials Chemistry C Vol. 11 Journal Issue: 44; ISSN 2050-7526
- Publisher:
- Royal Society of Chemistry (RSC)Copyright Statement
- Country of Publication:
- United Kingdom
- Language:
- English
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