Modifications in structural and electronic properties of TiO{sub 2} thin films using swift heavy ion irradiation
- Department of Physics, National Institute of Technology, Hamirpur 177005 (India)
- Center for Material Science and Engineering, National Institute of Technology, Hamirpur 177005 (India)
- European Synchrotron Radiation Facility (ESRF), BP 220, F-38043 Grenoble Cedex (France)
- Material Science Division, Inter-University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi 110067 (India)
- Nano Analysis Center, Korea Institute of Science and Technology (KIST), Seoul 136-791 (Korea, Republic of)
We report on the structural and electronic properties of swift heavy ion (SHI) irradiated pristine TiO{sub 2} thin films, deposited by radio frequency magnetron sputtering on sapphire substrates. The high resolution x-ray diffraction and Raman measurements show a structural phase transition from anatase to admixture of brookite and rutile phases of TiO{sub 2} with increasing SHI fluence followed by a significant distortion in the TiO{sub 6} octahedra. The modification in the electronic structure stimulated by SHI irradiation has been investigated using x-ray absorption (XAS) experiments at the O K and Ti L{sub 3,2} absorption edges. The O K edge spectra clearly indicate the splitting of the pre-edge spectral features having t{sub 2g} and e{sub g} symmetry bands due to structural disorder/distortion induced by irradiation. The intensity of the SHI generated components at the O K edge increases monotonically, which can be correlated to the modification in unoccupancies associated with O 2 p orbitals hybridized with Ti 3 d states. The XAS spectra at the Ti L{sub 3,2} edge further authenticate that SHI creates a controlled structural disorder/distortion in the TiO{sub 6} octahedra.
- OSTI ID:
- 22038742
- Journal Information:
- Journal of Applied Physics, Vol. 110, Issue 8; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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