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Title: Preparation and characterization of RF sputtered Ce-V mixed oxide thin films

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.4710162· OSTI ID:22004127
;  [1]
  1. Department of Physics, N. M. S. Sermathai Vasan College, Madurai-625 012 (India)

Cerium-Vanadium mixed oxide thin films were deposited at room temperature by varying RF power in RF magnetron sputtering. The morphology and structural features were studied by taking FESEM and XRD and optical properties were analyzed by taking transmittance and absorption spectra. The crystalline film shows orthorhombic CeVO{sub 3} phase and the observed grain size varies from 89.4nm to 208.7nm. The transmission increases and the absorption edge at 330nm is blue shifted with increase in RF power. The optical band gap is found to increase from 1.59 to 1.94eV. The PL spectra shows blue shift in the emission peak centered at a wavelength of 495nm with increase in RF power.

OSTI ID:
22004127
Journal Information:
AIP Conference Proceedings, Vol. 1447, Issue 1; Conference: 56. DAE solid state physics symposium 2011, Kattankulathur, Tamilnadu (India), 19-23 Dec 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English