Effect of electron beam irradiation on PMMA films
- Indus Synchrotron Utilization Division, RRCAT, Indore (M.P.), 452013 (India)
Polymethyl methacrylate (PMMA) is characterized for electron beam interactions in the resist layer in lithographic applications. PMMA thin films (free standing) were prepared by solvent casting method. These films were irradiated with 30keV electron beam at different doses. Structural and chemical properties of the films were studied by means of X-ray diffraction and Fourier transform infra-red (FTIR) spectroscopy The XRD results showed that the amorphization increases with electron beam irradiation dose. FTIR spectroscopic analysis reveals that electron beam irradiation promotes the scission of carbonyl group and depletes hydrogen and converts polymeric structure into hydrogen depleted carbon network.
- OSTI ID:
- 22004120
- Journal Information:
- AIP Conference Proceedings, Vol. 1447, Issue 1; Conference: 56. DAE solid state physics symposium 2011, Kattankulathur, Tamilnadu (India), 19-23 Dec 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ABSORPTION SPECTROSCOPY
AMORPHOUS STATE
CARBON
CARBONYLS
CHEMICAL PROPERTIES
ELECTRON BEAMS
FOURIER TRANSFORMATION
HYDROGEN
INFRARED SPECTRA
IRRADIATION
LAYERS
METHACRYLATES
PMMA
RADIATION DOSES
RADIATION EFFECTS
THIN FILMS
X-RAY DIFFRACTION