Soft magnetic properties of (Ni{sub 80}Fe{sub 20}){sub 1-x}(Ni{sub 0.5}Zn{sub 0.5}Fe{sub 2}O{sub 4}){sub x} films for high frequency applications
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054 (China)
- Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716 (United States)
A series of (Ni{sub 80}Fe{sub 20}){sub 1-x}(Ni{sub 0.5}Zn{sub 0.5}Fe{sub 2}O{sub 4}){sub x} films were fabricated on Si substrates by means of radio frequency magnetron sputtering and the electrical and magnetic properties were studied. Optimal films with the desired properties of low coercivity H{sub c} {approx} 4 Oe, high saturation magnetization 4{pi}Ms {approx} 14.5 kG, and high electrical resistivity {rho} {approx} 1500 {mu}{Omega} cm were obtained. The permeability spectra measured shows that its natural ferromagnetic resonant frequency was about 3.4 GHz. The tested results shown that the sputtering power had an important effect on the films properties and that it can be convenient to adjust the natural ferromagnetic resonant frequency of the films.
- OSTI ID:
- 21538237
- Journal Information:
- Journal of Applied Physics, Vol. 109, Issue 7; Conference: 55. annual conference on magnetism and magnetic materials, Atlanta, GA (United States), 14-18 Nov 2010; Other Information: DOI: 10.1063/1.3535550; (c) 2011 American Institute of Physics; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
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