Ion distribution measurements to probe target and plasma processes in electronegative magnetron discharges. I. Negative ions

Journal Article · Fri Apr 01 00:00:00 EDT 2011 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3553846· OSTI ID:21538210

Welzel, Th; Ellmer, K ^[1]; Naumov, S ^[2]

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1. Helmholtz-Zentrum Berlin fuer Materialien und Energie, Institut Solare Brennstoffe, Hahn-Meitner-Platz 1, D-14109 Berlin (Germany)
2. Leibniz-Institut fuer Oberflaechenmodifizierung e.V., Permoserstrasse 15, D-04318 Leipzig (Germany)

Mass and energy spectra of negative ions in magnetron sputtering discharges have been investigated with an energy-dispersive mass spectrometer. The dc magnetrons have been operated in the same reactive Ar/O{sub 2} atmosphere but with three different target materials: Cu, In, and W. Besides negative ions of the working gas, a variety of target metal containing negative molecular ions were found in the discharge. Their occurrence is strongly dependent on the target material. It has been correlated to the electron affinity and the bond strength of the molecules which has been calculated by density functional theory. Energy spectra of the negative ions exhibit three contributions that are clearly distinguishable. Their different origin is discussed as electron attachment in the gas phase and at the target surface, and molecule fragmentation during transport from target to substrate. The latter two contributions again significantly deviate for different target material. The high-energy part of the spectra has been analyzed with respect to the energy the particles gain upon release from the surface. It suggests that bigger molecules formed on the surface are released by ion-assisted desorption.

• OSTI ID: 21538210
• Journal Information: Journal of Applied Physics, Vol. 109, Issue 7; Other Information: DOI: 10.1063/1.3553846; (c) 2011 American Institute of Physics; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ANIONS
ARGON
COPPER
DENSITY FUNCTIONAL METHOD
DESORPTION
ELECTRIC DISCHARGES
ELECTRON ATTACHMENT
ENERGY SPECTRA
INDIUM
MAGNETRONS
MASS
MASS SPECTRA
MASS SPECTROMETERS
MOLECULAR IONS
PLASMA
SPUTTERING
SUBSTRATES
SURFACES
TARGETS
TUNGSTEN
CALCULATION METHODS
CHARGED PARTICLES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FLUIDS
GASES
IONS
MEASURING INSTRUMENTS
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NONMETALS
RARE GASES
REFRACTORY METALS
SORPTION
SPECTRA
SPECTROMETERS
TRANSITION ELEMENTS
VARIATIONAL METHODS