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Title: Effect of annealing and Nd concentration on the photoluminescence of Nd{sup 3+} ions coupled with silicon nanoparticles

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3510521· OSTI ID:21537950
; ; ; ;  [1]; ; ;  [2]
  1. CIMAP, UMR CNRS/CEA/ENSICAEN/UCBN, Ensicaen 6 Bd Marechal Juin, 14050 Caen Cedex 4 (France)
  2. Institute of Physics, Wroclaw University of Technology, Wybrzeze Wyspianskiego 27, 50-370 Wroclaw (Poland)

We report on the microstructure and photoluminescence (PL) properties of Nd-doped SiO{sub 2} thin films containing silicon nanoparticles (Si-np) as a function of the annealing temperature and the Nd concentration. The thin films, which were grown on Si substrates by reactive magnetron co-sputtering, contain the same Si excess. Fourier transform infrared (FTIR) spectra show that a phase separation occurs during the annealing due to the agglomeration of the Si excess resulting in the formation of Si-np. Besides, after annealing, the films exhibit PL from excitonic states confined in Si-np. We showed that the intensity of the PL of Nd{sup 3+} ions that occurs at {approx}0.92, 1.06, and 1.4 {mu}m is maximal at low Nd concentration and while well-passivated Si-np are formed. FTIR and x-ray measurements showed that the increase in the Nd incorporation has detrimental effects on the PL of Nd{sup 3+} because of the formation of Nd{sub 2}O{sub 3} nanocrystals and inherent disorder in the SiO{sub 2} host matrix. PL excitation measurements demonstrate that the PL of Nd{sup 3+} ions is nonresonant and follows the excitation of Si-np giving new evidence of the energy transfer from Si-np toward the rare earth ions.

OSTI ID:
21537950
Journal Information:
Journal of Applied Physics, Vol. 108, Issue 11; Other Information: DOI: 10.1063/1.3510521; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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