Physical and Chemical Changes of Polystyrene Nanospheres Irradiated with Laser

Journal Article · Wed May 25 00:00:00 EDT 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3586956· OSTI ID:21513238

Mustafa, Mohd Ubaidillah; Juremi, Nor Rashidah Md; Mohamad, Farizan; Wibawa, Pratama Jujur ^[1]; Agam, Mohd Arif; Ali, Ahmad Hadi ^[2]

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1. Microelectronic and Nanotechnology-Shamsudin Research Centre, Faculty of Electrical and Electronic Engineering, University Tun Hussein Onn Malaysia (Malaysia)
2. Faculty of Science, Art and Heritage, University Tun Hussein Onn Malaysia (Malaysia)

It has been reported that polymer resist such as PMMA (Poly(methyl methacrylate) which is a well known and commonly used polymer resist for fabrication of electronic devices can show zwitter characteristic due to over exposure to electron beam radiation. Overexposed PMMA tend to changes their molecular structure to either become negative or positive resist corresponded to electron beam irradiation doses. These characteristic was due to crosslinking and scissors of the PMMA molecular structures, but till now the understanding of crosslinking and scissors of the polymer resist molecular structure due to electron beam exposure were still unknown to researchers. Previously we have over exposed polystyrene nanospheres to various radiation sources, such as electron beam, solar radiation and laser, which is another compound that can act as polymer resist. We investigated the physical and chemical structures of the irradiated polystyrene nanospheres with FTIR analysis. It is found that the physical and chemical changes of the irradiated polystyrene were found to be corresponded with the radiation dosages. Later, combining Laser irradiation and Reactive Ion Etching manipulation, created a facile technique that we called as LARIEA NSL (Laser and Reactive Ion Etching Assisted Nanosphere Lithography) which can be a facile technique to fabricate controllable carbonaceous nanoparticles for applications such as lithographic mask, catalysts and heavy metal absorbers.

• OSTI ID: 21513238
• Journal Information: AIP Conference Proceedings, Vol. 1341, Issue 1; Conference: Escinano2010: 2010 international conference on enabling science and nanotechnology, Kuala Lumpur (Malaysia), 1-3 Dec 2010; Other Information: DOI: 10.1063/1.3586956; (c) 2011 American Institute of Physics; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY
CROSS-LINKING
ELECTRON BEAMS
ELECTRONIC EQUIPMENT
ETCHING
HEAVY METALS
INFRARED SPECTRA
IONS
LASER RADIATION
METHACRYLIC ACID ESTERS
MOLECULAR STRUCTURE
NANOSTRUCTURES
PMMA
POLYSTYRENE
RADIATION DOSES
RADIATION SOURCES
RESPIRATORS
SOLAR RADIATION
BEAMS
CARBOXYLIC ACID ESTERS
CHARGED PARTICLES
CHEMICAL REACTIONS
DOSES
ELECTROMAGNETIC RADIATION
ELEMENTS
EQUIPMENT
ESTERS
LEPTON BEAMS
MATERIALS
METALS
ORGANIC COMPOUNDS
ORGANIC POLYMERS
PARTICLE BEAMS
PETROCHEMICALS
PETROLEUM PRODUCTS
PLASTICS
POLYACRYLATES
POLYMERIZATION
POLYMERS
POLYOLEFINS
POLYVINYLS
RADIATIONS
SPECTRA
STELLAR RADIATION
SURFACE FINISHING
SYNTHETIC MATERIALS