Spatial and temporal evolution of ion energies in high power impulse magnetron sputtering plasma discharge

Journal Article · Wed Sep 15 00:00:00 EDT 2010 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3486018· OSTI ID:21483620

Hecimovic, A; Ehiasarian, A P ^[1]

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1. Nanotechnology Centre for PVD Research, Materials and Engineering Research Centre, Sheffield Hallam University, S1 1WB Sheffield (United Kingdom)

High power impulse magnetron sputtering (HIPIMS) is a novel deposition technology successfully implemented on full scale industrial machines. HIPIMS utilizes short pulses of high power delivered to the target in order to generate high amount of metal ions. The life-span of ions between the pulses and their energy distribution could strongly influence the properties and characteristics of the deposited coating. In modern industrial coating machines the sample rotates on a substrate holder and changes its position and distance with regard to the magnetron. Time resolved measurements of the ion energy distribution function (IEDF) at different distances from the magnetron have been performed to investigate the temporal evolution of ions at various distances from target. The measurements were performed using two pressures, 1 and 3 Pa to investigate the influence of working gas pressure on IEDF. Plasma sampling energy-resolved mass spectroscopy was used to measure the IEDF of Ti{sup 1+}, Ti{sup 2+}, Ar{sup 1+}, and Ar{sup 2+} ions in HIPIMS plasma discharge with titanium (Ti) target in Ar atmosphere. The measurements were done over a full pulse period and the distance between the magnetron and the orifice of the mass spectrometer was changed from 25 to 215 mm.

• OSTI ID: 21483620
• Journal Information: Journal of Applied Physics, Vol. 108, Issue 6; Other Information: DOI: 10.1063/1.3486018; (c) 2010 American Institute of Physics; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON
ARGON IONS
CHEMICAL ANALYSIS
ELECTRIC DISCHARGES
ENERGY SPECTRA
LIFE SPAN
MAGNETRONS
MASS SPECTRA
MASS SPECTROSCOPY
PLASMA
PLASMA DIAGNOSTICS
PULSES
SPUTTERING
SUBSTRATES
SURFACE COATING
TIME RESOLUTION
TITANIUM
TITANIUM IONS
CHARGED PARTICLES
DEPOSITION
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FLUIDS
GASES
IONS
METALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NONMETALS
RARE GASES
RESOLUTION
SPECTRA
SPECTROSCOPY
TIMING PROPERTIES
TRANSITION ELEMENTS