Control of the discharge chemistry of CHF{sub 3} in dual-frequency capacitively coupled plasmas
- Department of Physics, Soochow University, Suzhou 215006 (China)
- SiChuan University of Science and Engineering, ZiGong 643000 (China)
The discharge chemistry of CHF{sub 3} in 27/2, 60/2, and 60/13.56 MHz dual-frequency capacitively coupled plasmas (DF-CCPs) is studied with actinometric optical emission spectroscopy and mass spectrometry. The frequency effect on the generation of reactive species was investigated. The reactive radicals and the density ratio of F/CF{sub 2} could be controlled by the 2 MHz rf power in 27/2 and 60/2 MHz DF-CCPs. The density ratios of F/CF{sub 2} in 27/2 and 60/2 MHz DF-CCPs are observed to increase with an increase in low-frequency power. However, this control could not be obtained in 60/13.56 MHz DF-CCP.
- OSTI ID:
- 21124083
- Journal Information:
- Applied Physics Letters, Vol. 93, Issue 7; Other Information: DOI: 10.1063/1.2973402; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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