Modulating effects of the low-frequency source on ion energy distributions in a dual frequency capacitively coupled plasma
- State Key Laboratory of Materials Modification by Beams, School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)
With the energy resolved quadrupole mass spectrometer and hybrid simulation, the influence of low-frequency (LF) source parameters on the ion energy distributions (IEDs) of argon ions impinging on the grounded electrode was studied, both experimentally and numerically, in a dual frequency capacitively coupled plasma. It was shown that for decreasing LF or increasing LF power, the high energy peak in IEDs shifts toward the high energy region significantly. The simulation results were in general agreement with the experimental data.
- OSTI ID:
- 21123989
- Journal Information:
- Applied Physics Letters, Vol. 93, Issue 3; Other Information: DOI: 10.1063/1.2945890; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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