Influence of the deposition-induced stress on the magnetic properties of magnetostrictive amorphous (Fe{sub 80}Co{sub 20}){sub 80}B{sub 20} multilayers with orthogonal anisotropy
- Instituto de Sistemas Optoelectronicos y Microtecnologia, Universidad Politecnica de Madrid, E.T.S.Ing. Telecomunicacion, Ciudad Universitaria s/n Madrid, 28040, Madrid (Spain)
In this work, we experimentally justify that the control of the mechanical stress induced during the deposition of sputtered amorphous magnetostrictive (Fe{sub 80}Co{sub 20}){sub 80}B{sub 20} allows a custom design of its magnetic properties. FeCoB multilayers have been sputtered on thermal oxide Si substrates with different buffer materials. The crystalline quality and the thermomechanical properties of the buffer layer influence both the coercive and the anisotropy field. Those buffer layers with both high rigidity and poor thermal conductivity do not allow the dissipation of energy of the incoming sputtered material. Therefore, the mechanical stresses related to the deposition process cannot be released, leading to magnetic layers with high easy-axis coercive field and low anisotropy field. This shows that the mechanical stresses accumulated during deposition are a key parameter for the control of coercivity.
- OSTI ID:
- 21057557
- Journal Information:
- Journal of Applied Physics, Vol. 102, Issue 12; Other Information: DOI: 10.1063/1.2822220; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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