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Title: Hard X-ray Focusing less than 50nm for Nanoscopy/spectroscopy

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.2436178· OSTI ID:21052634
; ; ; ; ;  [1]; ; ;  [2]; ;  [3];  [4];  [3]
  1. Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871 (Japan)
  2. Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871 (Japan)
  3. SPring-8/RIKEN, 1-1-1 Kouto, Mikazuki, Hyogo 679-5148 (Japan)
  4. SPring-8/Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Mikazuki, Hyogo 679-5148 (Japan)

X-ray focusing using a Kirkpatrick-Baez (KB) setup with two total reflection mirrors is a promising method, allowing highly efficient and energy-tunable focusing. Fabricated mirrors having a figure accuracy of 1 nm peak-to-valley height gave ideal diffraction-limited focusing of hard X-rays. The focal size, defined as the full width at half maximum of the intensity profile, was 36 nm x 48 nm at an X-ray energy of 15 keV. Fluorescence X-ray microscopy with KB mirrors was also developed, targeting cell biological applications. The distribution of various elements in a single cell was successfully observed with high resolution. The developed microscopy is already used for various applications in the medical field. Our next main project is the realization of sub-10-nm-level hard X-ray focusing. At-wavelength metrology is being developed, in which a phase-retrieval simulator is coded for the determination of phase errors on mirror surfaces from only the intensity profiles of a focused beam.

OSTI ID:
21052634
Journal Information:
AIP Conference Proceedings, Vol. 879, Issue 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436178; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English