Preparation and properties of highly (100)-oriented Pb(Zr{sub 0.2}Ti{sub 0.8})O{sub 3} thin film prepared by rf magnetron sputtering with a PbO{sub x} buffer layer
- Department of Materials Science, Sichuan University, Chengdu 610064 (China)
A method for fabrication of highly (100)-oriented Pb(Zr{sub 0.2}Ti{sub 0.8})O{sub 3} (PZT) thin films by rf magnetron sputtering with a special buffer of PbO{sub x} (RFMS-SBP) was developed. With this method, highly (100)-oriented Pb(Zr{sub 0.2}Ti{sub 0.8})O{sub 3} thin films were prepared on the PbO{sub x}/Pt(111)/Ti/SiO{sub 2}/Si(100) substrates, and the preferential (100) orientation of the Pb(Zr{sub 0.2}Ti{sub 0.8})O{sub 3} film is 92%. The (100) orientation of the PbO{sub x} buffer layer leads to the (100) orientation of the PZT thin films, and the thickness of the buffer layer plays a significant role on the phase purity and electrical properties of the films. Highly (100)-oriented Pb(Zr{sub 0.2}Ti{sub 0.8})O{sub 3} thin films with proper thickness of PbO{sub x} buffer layer possess good electrical properties with larger remnant polarization P{sub r} (69.7 {mu}C/cm{sup 2}), lower coercive field E{sub c} (92.4 kV/cm), and good pyroelectric coefficient at room temperature (2.6x10{sup -8} C/cm{sup 2} K). The butterfly-shaped {epsilon}-E characteristic curve gives the evidence of the improved in-plane ferroelectric property in the films.
- OSTI ID:
- 20982846
- Journal Information:
- Journal of Applied Physics, Vol. 101, Issue 9; Other Information: DOI: 10.1063/1.2723190; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
BUFFERS
DEPOSITION
ELECTRIC CHARGES
ELECTRICAL PROPERTIES
FERROELECTRIC MATERIALS
GRAIN ORIENTATION
LAYERS
LEAD OXIDES
PIEZOELECTRICITY
PLATINUM
POLARIZATION
PZT
SILICON
SILICON OXIDES
SPUTTERING
SUBSTRATES
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
TITANIUM