Wave-optical simulation of hard-x-ray nanofocusing by precisely figured elliptical mirrors
Computer simulations of nanofocusing by elliptical mirrors are presented wherein the diffraction and propagation of coherent hard x rays are predicted using wave-optical calculations. Surface height data acquired via microstitching interferometry were used to calculate the complex pupil function of a mirror, taking into account the Fresnel reflectivity and treating the surface topography as an aberration to a perfect elliptical mirror. The reflected wave-field amplitude and phase downstream of the mirror were obtained by numerically evaluating the Fresnel-Kirchhoff diffraction integral. Simulated intensity profiles and contours (isophotes) around the focal plane are presented for coherent illumination by a15 keV point source, which indicate nearly diffraction-limited focusing at the40 nm level. The effect of high spatial frequency microroughness on nanofocusing was investigated by low-pass filtering the Fourier spectrum of the residual height profile. Simulations using the filtered metrology data confirmed that roughness length scales shorter than0.1 mm have a minor effect on the focal spot size and intensity.
- OSTI ID:
- 20929655
- Journal Information:
- Applied Optics, Vol. 46, Issue 11; Other Information: DOI: 10.1364/AO.46.002010; (c) 2007 Optical Society of America; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6935
- Country of Publication:
- United States
- Language:
- English
Similar Records
Comparison of two methods for simulation of hard X-ray nanofocusing by elliptical mirrors.
Optics fabrication and metrology for nanofocusing of hard x-rays