Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O{sub 2} mixtures
- IFM Material Physics, Linkoeping University, SE-581 83 Linkoeping (Sweden)
The ion flux obtained during reactive magnetron sputtering of an Al target in Ar/O{sub 2} gas mixtures was studied by energy-resolved mass spectrometry, as a function of the total and O{sub 2} partial pressures. The positive ions of film-forming species exhibited bimodal energy distributions, both for direct current and radio frequency discharges, with the higher energy ions most likely originating from sputtered neutrals. For the negative oxygen ions a high-energy peak was observed, corresponding to ions formed at the target surface and accelerated towards the substrate over the sheath potential. As the total pressure was increased the high-energy peaks diminished due to gas-phase scattering. Based on these results, the role of energetic bombardment for the phase constituent of alumina thin films are discussed.
- OSTI ID:
- 20879979
- Journal Information:
- Journal of Applied Physics, Vol. 100, Issue 3; Other Information: DOI: 10.1063/1.2219163; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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