Eucentric four-axis ultrahigh vacuum goniometer for reflection high-energy electron diffraction applications
- Experimentalphysik VI, Elektronische Korrelationen und Magnetismus, Institut fuer Physik, Universitaet Augsburg, Universitaetsstrasse 1, D-86135 Augsburg (Germany)
The design and performance of a four-axis low-profile eucentric UHV goniometer for in situ reflection high-energy electron diffraction (RHEED) studies during film deposition is reported. The design provides one translational and three rotational degrees of freedom that are fully independent. Although developed to facilitate high-pressure RHEED during the growth of oxide thin films by pulsed laser deposition, this goniometer design is applicable to other UHV techniques including molecular beam epitaxy. The goniometer requires only a single DN 100 CF flange (6 in. o.d., 100 mm i.d.), making it suitable for small deposition systems, too. Samples, attached to a resistively heated holder, can be easily transferred on and off of the goniometer without breaking vacuum. The holder accommodates samples up to 10 mmx10 mm in size and allows them to be heated to 900 deg. C in pure oxygen while being attached to the goniometer. Full eucentric motion of the hot sample is possible with a typical axis precision of <0.1 deg. Most of the mechanism is located in air, allowing the use of standard materials and lubricants, substantially reducing the in-vacuum mechanics, and increasing the precision, reliability, and robustness of the system.
- OSTI ID:
- 20778486
- Journal Information:
- Review of Scientific Instruments, Vol. 76, Issue 12; Other Information: DOI: 10.1063/1.2138687; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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