Growth of heteroepitaxial ZnO thin film and ZnO/(Mg,Zn)O nanomultilayer by off-axis rf magnetron sputtering
- Thin Film Materials Research Center, Korea Institute of Science and Technology, 39-1 Hawolgok-dong, Seongbuk-gu, Seoul 136-791 (Korea, Republic of)
Heteroepitaxial ZnO thin film was deposited on a sapphire (001) substrate using off-axis radio-frequency magnetron sputtering. The crystallinity of the ZnO thin film was affected by deposition pressure, substrate temperature, and postannealing temperature. The low-temperature photoluminescence of heteroepitaxial ZnO thin film grown under optimum conditions of 650 deg. C, 120 W, and 10 mTorr showed strong UV emission at 3.36 eV with a full width at half maximum (FWHM) of 16.0 meV. After annealing in an O{sub 2} ambient at 950 deg. C, the high-resolution x-ray diffraction rocking curve FWHM of the ZnO thin film markedly decreased from 0.38 deg. to 0.19 deg. although UV emission decreased. These results indicated that a heteroepitaxial ZnO thin film with strong UV emission can be grown by off-axis rf sputtering and that O{sub 2} annealing helps enhance the crystallinity of ZnO thin film which can be used as a buffer layer in ZnO/(Mg,Zn)O multiple quantum well structures. To demonstrate an application of the ZnO thin film, a ZnO/(Mg,Zn)O nanomultilayer was grown on a ZnO-buffered sapphire substrate and its optical properties were measured.
- OSTI ID:
- 20636949
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 23, Issue 1; Other Information: DOI: 10.1116/1.1814105; (c) 2005 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ANNEALING
EPITAXY
EV RANGE 01-10
MAGNESIUM OXIDES
MAGNETRONS
MEV RANGE 10-100
OPTICAL PROPERTIES
PHOTOLUMINESCENCE
QUANTUM WELLS
RADIOWAVE RADIATION
SAPPHIRE
SPUTTERING
SURFACE COATING
TEMPERATURE RANGE 0065-0273 K
THIN FILMS
X-RAY DIFFRACTION
ZINC OXIDES