Atom probe field-ion microscopy characterization of nickel and titanium aluminides

Journal Article · Tue Feb 01 00:00:00 EST 2000 · Materials Characterization

DOI:https://doi.org/10.1016/S1044-5803(99)00049-2· OSTI ID:20014565

Larson, D J; Miller, M K

A review of the contributions of atom probe field-ion microscopy to the characterization of nickel and titanium aluminides is presented. The nickel aluminide systems studied include boron-doped Ni{sub 3}Al and boron-, carbon-, beryllium-, zirconium-, molybdenum-, and hafnium-doped NiAl. These systems have been characterized in terms of solute segregation to boundaries, dislocations, and other defects, matrix solubilities, precipitation, and site-occupation probabilities. The partitioning behavior of impurities and alloying additions, matrix solubilities, precipitate compositions, and interfacial segregation in several of {alpha}{sub 2} + {gamma} titanium aluminides and related alloys are also reviewed.

• Research Organization: Oak Ridge National Lab., TN (US)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC05-96OR22464
• OSTI ID: 20014565
• Journal Information: Materials Characterization, Vol. 44, Issue 1-2; Other Information: PBD: Jan-Feb 2000; ISSN 1044-5803
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
NICKEL ALLOYS
ALUMINIUM ALLOYS
ION MICROSCOPY
GRAIN BOUNDARIES
SEGREGATION
DISLOCATIONS
DOPED MATERIALS
TITANIUM ALLOYS
MATRIX MATERIALS
SOLUBILITY