Dirac Fermion Cloning, Moiré Flat Bands, and Magic Lattice Constants in Epitaxial Monolayer Graphene
- University of Missouri, Columbia, MO (United States)
- RIKEN Interdisciplinary Theoretical and Mathematical Sciences (iTHEMS) Wako (Japan)
- University of Missouri, Columbia, MO (United States); Southern University of Science and Technology, Shenzhen (China)
- Southern University of Science and Technology, Shenzhen (China)
- University of Illinois at Urbana-Champaign, IL (United States). Frederick Seitz Materials Research Laboratory
Tuning interactions between Dirac states in graphene has attracted enormous interest because it can modify the electronic spectrum of the 2D material, enhance electron correlations, and give rise to novel condensed-matter phases such as superconductors, Mott insulators, Wigner crystals, and quantum anomalous Hall insulators. Previous works predominantly focus on the flat band dispersion of coupled Dirac states from different twisted graphene layers. Here in this work, a new route to realizing flat band physics in monolayer graphene under a periodic modulation from substrates is proposed. Graphene/SiC heterostructure is taken as a prototypical example and it is demonstrated experimentally that the substrate modulation leads to Dirac fermion cloning and, consequently, the proximity of the two Dirac cones of monolayer graphene in momentum space. Theoretical modeling captures the cloning mechanism of the Dirac states and indicates that moiré flat bands can emerge at certain magic lattice constants of the substrate, specifically when the period of modulation becomes nearly commensurate with the ($$\sqrt{3}$$ x $$\sqrt{3}$$) R30° supercell of graphene. Our results show that epitaxial single monolayer graphene on suitable substrates is a promising platform for exploring exotic many-body quantum phases arising from interactions between Dirac electrons.
- Research Organization:
- Univ. of Missouri, Columbia, MO (United States); Univ. of Illinois at Urbana-Champaign, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE); National Science Foundation (NSF)
- Grant/Contract Number:
- FG02-05ER46203; FG02-07ER46383; SC0019114; DMR-1809160
- OSTI ID:
- 1976209
- Journal Information:
- Advanced Materials, Vol. 34, Issue 26; ISSN 0935-9648
- Publisher:
- WileyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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