Analytical modeling and simulation of electrical contact resistance for elastic rough electrode surface contact including frictional temperature rise

Talukder, Sujoy; Yeo, Chang-Dong; Hong, Yang-Ki; Choi, Minyeong; Flicek, Robert C.; Bishop, Joseph E.

doi:10.1063/5.0073093

Title: Analytical modeling and simulation of electrical contact resistance for elastic rough electrode surface contact including frictional temperature rise

Journal Article · Wed Feb 02 00:00:00 EST 2022 · AIP Advances

DOI:https://doi.org/10.1063/5.0073093· OSTI ID:1882878

^[1];

^[1]; Hong, Yang-Ki ^[2]; Choi, Minyeong ^[2]; Flicek, Robert C. ^[3];

^[3]

Texas Tech Univ., Lubbock, TX (United States)
Univ. of Alabama, Tuscaloosa, AL (United States)
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

An improved electrical contact resistance (ECR) model for elastic rough electrode contact is proposed, incorporating the effects of asperity interactions and temperature rise by frictional and joule heating. The analytical simulation results show that the ECR decreases steeply at the beginning of the contact between Al and Cu. However, it becomes stabilized after reaching a specific contact force. It is also found that the longer elapsed sliding contact time, the higher ECR due to the increase in electrical resistivity of electrode materials by the frictional temperature rise at the interface. The effects of surface roughness parameters on ECR are studied through the 3² full-factorial design-of-experiment analysis. Based on the two representative roughness parameters, i.e., root-mean-square (rms) roughness and asperity radius, their individual and coupled effects on the saturated ECR are examined. The saturated ECR increases with the rms roughness for a rough machined surface condition, but it is hardly affected by the asperity radius. On the other hand, the saturated ECR increases with both the rms roughness and the asperity radius under a smooth thin film surface condition.

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Research Organization:: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: NA0003525; 1964744; NA-0003525

OSTI ID:: 1882878

Alternate ID(s):: OSTI ID: 1843316

Report Number(s):: SAND2022-0915J; 703091; TRN: US2308144

Journal Information:: AIP Advances, Vol. 12, Issue 2; ISSN 2158-3226

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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