The Third Dimension of Ferroelectric Domain Walls
- Department of Materials Science and Engineering NTNU Norwegian University of Science and Technology Trondheim 7491 Norway
- Institut de Ciència de Materials de Barcelona (ICMAB‐CSIC) Campus UAB Bellaterra 08193 Spain
- Department of Materials Science and Engineering University of Connecticut Storrs CT 06269 USA
- Department of Physics NTNU Norwegian University of Science and Technology Trondheim 7491 Norway, SuperSTEM STFC Daresbury Laboratories Keckwick Lane Warrington WA4 4AD UK
- Department of Physics ETH Zurich Zürich 8093 Switzerland, Materials Sciences Division Lawrence Berkeley National Laboratory Berkeley CA 94720 USA
- Materials Sciences Division Lawrence Berkeley National Laboratory Berkeley CA 94720 USA
- Universite Grenoble Alpes, CNRS, Grenoble INP Institut Néel Grenoble France
- Department of Physics NTNU Norwegian University of Science and Technology Trondheim 7491 Norway
Abstract Ferroelectric domain walls are quasi‐2D systems that show great promise for the development of nonvolatile memory, memristor technology, and electronic components with ultrasmall feature size. Electric fields, for example, can change the domain wall orientation relative to the spontaneous polarization and switch between resistive and conductive states, controlling the electrical current. Being embedded in a 3D material, however, the domain walls are not perfectly flat and can form networks, which leads to complex physical structures. In this work, the importance of the nanoscale structure for the emergent transport properties is demonstrated, studying electronic conduction in the 3D network of neutral and charged domain walls in ErMnO 3 . By combining tomographic microscopy techniques and finite element modeling, the contribution of domain walls within the bulk is clarified and the significance of curvature effects for the local conduction is shown down to the nanoscale. The findings provide insights into the propagation of electrical currents in domain wall networks, reveal additional degrees of freedom for their control, and provide quantitative guidelines for the design of domain‐wall‐based technology.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division; European Research Council (ERC); National Science Foundation (NSF); Ministry of Economic Affairs and Digital Transformation of Spain (MINECO)
- Grant/Contract Number:
- AC02-05CH11231; 863691; 724529; DMR:MRI:1726862; MAT2016-77100-C2-2-P; SEV-2015-0496
- OSTI ID:
- 1880145
- Alternate ID(s):
- OSTI ID: 1886071; OSTI ID: 1906709
- Journal Information:
- Advanced Materials, Journal Name: Advanced Materials Vol. 34 Journal Issue: 36; ISSN 0935-9648
- Publisher:
- Wiley Blackwell (John Wiley & Sons)Copyright Statement
- Country of Publication:
- Germany
- Language:
- English
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