A near-field study of VO2/(100)TiO2 film and its crack-induced strain relief

Chen, Xinzhong; Kittiwatanakul, Salinporn; Cheng, Yinke; Slusar, Tetiana V.; Mcleod, Alexander S.; Li, Zhuoqi; Kim, Hyun-Tak; Basov, D. N.; Liu, Mengkun

doi:10.1063/5.0099142

Title: A near-field study of VO2/(100)TiO2 film and its crack-induced strain relief

Journal Article · Tue Jul 12 00:00:00 EDT 2022 · Applied Physics Letters

DOI:https://doi.org/10.1063/5.0099142· OSTI ID:1875941

;

; Cheng, Yinke; Slusar, Tetiana V.; Mcleod, Alexander S.; Li, Zhuoqi;

; Basov, D. N.; Liu, Mengkun

Temperature-induced metal–insulator transition (MIT) in vanadium dioxide (VO2) has been under intense research interest for decades both theoretically and experimentally. Due to the complex nature of electron correlations, the underlying physics behind the MIT in VO2 has yet to be fully grasped. In this work, we utilize the fine resolution of the scattering-type scanning near-field optical microscope to investigate the MIT in an epitaxial VO2 thin film on the (100)R TiO2 substrate with mid-infrared light. Bidirectional tweed-like metal–insulator phase coexistence patterns are observed and understood under the Landau free energy paradigm. More interestingly, delayed metallic nucleation is observed near the surface cracks due to local strain relief. This research proposes ideas in investigating the temperature–pressure phase diagram and tuning the interplay between local strain and MIT in oxide thin films.

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Sponsoring Organization:: USDOE

Grant/Contract Number:: SC0012704

OSTI ID:: 1875941

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Vol. 121 Journal Issue: 2; ISSN 0003-6951

Publisher:: American Institute of PhysicsCopyright Statement

Country of Publication:: United States

Language:: English

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