Direct intercalation of MoS2 and WS2 thin films by vacuum filtration

Kuo, Ding-Yuan; Cossairt, Brandi M.

doi:10.1039/d1mh01193f

Title: Direct intercalation of MoS₂ and WS₂ thin films by vacuum filtration

Journal Article · Wed Sep 15 00:00:00 EDT 2021 · Materials Horizons

DOI:https://doi.org/10.1039/d1mh01193f· OSTI ID:1865653

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Univ. of Washington, Seattle, WA (United States)

In the development of next-generation electronics and energy devices, intercalation compounds of transition metal dichalcogenides (TMDCs) are gaining attention for their unique properties that result from synergistic interactions between guest species and host materials. Nowadays, intercalation compounds of MoS₂ and WS₂ are commonly prepared by a two-step process: (1) exfoliation to form single-layer and/or few-layer nanosheets and (2) restacking the nanosheets with the guest species by vigorously mixing the exfoliated suspension with the solution of guest species. While a wide variety of intercalation compounds have been synthesized using this approach, the intercalation process is often timeconsuming, and the product slurry limits material quality and impedes characterization and applications. Herein, we report a versatile method for preparing intercalated TMDCs in a thin-film morphology. Using this approach, we successfully prepared a range of existing intercalation compounds of MoS₂ and WS₂ (e.g., ferrocene and amine intercalated MoS₂ and WS₂). Additionally, by leveraging the versatility of this intercalation method, we report we intercalated phenazine and benzoquinone into MoS₂ and WS₂ for the first time.

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Research Organization:: Northwestern Univ., Evanston, IL (United States); Energy Frontier Research Centers (EFRC) (United States). Center for Molecular Electrocatalysis

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF); Molecular Engineering & Sciences Institute; Clean Energy Institute

Grant/Contract Number:: SC0021314; NNCI-2025489; NNCI-1542101

OSTI ID:: 1865653

Alternate ID(s):: OSTI ID: 1820224

Journal Information:: Materials Horizons, Vol. 9, Issue 1; ISSN 2051-6347

Publisher:: Royal Society of ChemistryCopyright Statement

Country of Publication:: United States

Language:: English

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