Manufacturing Over Many Scales: High Fidelity Macroscale Coverage of Nanoporous Metal Arrays via Lift-Off-Free Nanofabrication
Journal Article
·
· Advanced Materials Interfaces
- ETH Zurich (Switzerland)
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). Center of Micro and Nano Technology
A low-cost, high-throughput, lift-off-free nanolithographic method is developed for creating hexagonal arrays of sub-30-nm-sized pores on a metal film, achieving uniform coverage over an entire wafer of 10 cm in diameter. Additionally, spherical nanodomains of poly(methyl methacrylate) are demonstrated to be well-controlled and self-aligned within a polystyrene matrix layer on a metal thin film without any intermediary coating. After removal of PMMA, the porous PS thin film acts as an etch mask for defining nanoscale pores in the metal underlayer by Ar ion beam milling, resulting in wafer-scale patterning with great fidelity.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program
- Grant/Contract Number:
- AC52-07NA27344
- OSTI ID:
- 1841329
- Report Number(s):
- LLNL-JRNL-656009; 776661
- Journal Information:
- Advanced Materials Interfaces, Vol. 1, Issue 7; ISSN 2196-7350
- Publisher:
- Wiley-VCHCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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