Growth and characterization of novel Ir1–xCrxO2 thin films

Arias-Egido, E.; Laguna-Marco, M. A.; Piquer, C.; Chaboy, J.; Fabbris, G.; Haskel, D.

doi:10.1016/j.matdes.2020.109083

Title: Growth and characterization of novel Ir1–xCrxO2 thin films

Journal Article · Sun Nov 01 00:00:00 EDT 2020 · Materials & Design

DOI:https://doi.org/10.1016/j.matdes.2020.109083· OSTI ID:1769500

Arias-Egido, E.; Laguna-Marco, M. A.; Piquer, C.; Chaboy, J.; Fabbris, G.; Haskel, D.

Novel Ir_1–xCr_xO₂ thin films have been prepared by reactive co–sputtering deposition. Composition, structure and electric and magnetic behavior have been analyzed by different techniques including EDX, XRR, XRD, SQUID magnetometry, electrical resistivity and XANES and XMCD spectroscopies. Despite the difficulty in growing CrO₂ by physical deposition techniques, an Ir_1–xCr_xO₂ solid solution phase could be achieved for 0 ≤ x ≤ 0.8, where the oxidation state of Cr is found to remain as 4+. Both the electrical and the magnetic behavior are shown to starkly depart from those of the parent IrO₂ (paramagnetic metal) and CrO₂ (half–metal ferromagnet) compounds. In particular, they show a semiconducting behavior, dρ/dT < 0 and giant magnetic coercivity at low temperatures. XMCD reveals a significant contribution of Ir to the magnetic response of the Ir_1–xCr_xO₂ films. In addition, the nature of the magnetic moment of the Ir⁴⁺ ion ($$\langle$$m_l$$\rangle$$/$$\langle$$m_s$$\rangle$$ = 0.09) is completely different from the large orbital moment that is a hallmark of insulating Ir⁴⁺ oxides. This suggests a Cr–induced magnetic moment, which is a remarkably surprising result for an oxide.

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Research Organization:: Argonne National Lab. (ANL), Argonne, IL (United States)

Sponsoring Organization:: USDOE; Spanish Ministry of Science and Innovation (MICINN); Spanish Ministerio de Economia y Competitividad (MINECO); European Social Fund (ESF)

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1769500

Alternate ID(s):: OSTI ID: 1663378

Journal Information:: Materials & Design, Journal Name: Materials & Design Vol. 196 Journal Issue: C; ISSN 0264-1275

Publisher:: ElsevierCopyright Statement

Country of Publication:: United Kingdom

Language:: English

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