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Title: High Power Diode Pump Laser Amplifier for Laser-Driven Ultrafast Table-Top X-Ray Laser sources

Technical Report ·
OSTI ID:1728578

XUV Lasers in collaboration with Colorado State University developed a high average power, high energy solid state laser for pumping a new generation of high average power ultrafast x-ray sources. Its unique combination of high pulse energy and high repetition rate finds applications in driving atomic table-top soft x-ray lasers, optical parametric amplifiers for high harmonic x-ray sources, plasma based soft x-ray lasers, high average power Compton x-ray sources, and intense incoherent ultrafast hard x-ray generation from plasmas. The high average power and high pulse energy also finds application in materials processing. Atomic soft x-ray lasers (SXRLs), based on the amplification of soft x-ray radiation in population inversions generated in laser-driven plasmas, generate the highest number of photons per pulse of any table-top coherent source. However, the low repetition rate (typically 1-10 Hz) of the high energy optical laser drivers used to pump atomic SXRLs into the gain-saturated regime necessary for efficient operation has significantly limited their average power. The project goal was to develop a diode-pumped, high repetition rate, pump laser amplifier to overcome the limitation imposed by the low repetition rate of conventional flashlamp pumping of solid state lasers that in turn serve as pump sources for compact table-top soft x-ray sources. The project goal was to develop an efficient and compact high average power laser capable to generate 1 J pulses of picosecond duration at 1 kHz high repetition rate, 1 kilowatt average power, based on diode pumping of cryogenically cooled Yb:YAG.

Research Organization:
XUV Lasers, Inc., Fort Collins, CO (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
Contributing Organization:
Lawrence Livermore National Lab
DOE Contract Number:
SC0011375
OSTI ID:
1728578
Type / Phase:
STTR (Phase IIA)
Report Number(s):
Final Report Phase IIA: DOE -0011375 XUV Lasers; XUV Lasers, 0011375 Phase IIA Final
Country of Publication:
United States
Language:
English

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