Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate [Formation Mechanisms of Boron Oxide Fillms Fabricated by Large Area Electron Beam-Induced Deposition of Trimethyl Borate]

Martin, Aiden A.; Depond, Philip J.

doi:10.3762/bjnano.9.120

Title: Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate [Formation Mechanisms of Boron Oxide Fillms Fabricated by Large Area Electron Beam-Induced Deposition of Trimethyl Borate]

Journal Article · Tue Apr 24 00:00:00 EDT 2018 · Beilstein Journal of Nanotechnology

DOI:https://doi.org/10.3762/bjnano.9.120· OSTI ID:1438773

^[1]; Depond, Philip J. ^[1]

Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Boron-containing materials are increasingly drawing interest for the use in electronics, optics, laser targets, neutron absorbers, and high-temperature and chemically resistant ceramics. In this article, the first investigation into the deposition of boron-based material via electron beam-induced deposition (EBID) is reported. Thin films were deposited using a novel, large-area EBID system that is shown to deposit material at rates comparable to conventional techniques such as laser-induced chemical vapor deposition. The deposition rate and stoichiometry of boron oxide fabricated by EBID using trimethyl borate (TMB) as precursor is found to be critically dependent on the substrate temperature. By comparing the deposition mechanisms of TMB to the conventional, alkoxide-based precursor tetraethyl orthosilicate it is revealed that ligand chemistry does not precisely predict the pathways leading to deposition of material via EBID. Lastly, the results demonstrate the first boron-containing material deposited by the EBID process and the potential for EBID as a scalable fabrication technique that could have a transformative effect on the athermal deposition of materials.

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Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: AC52-07NA27344

OSTI ID:: 1438773

Report Number(s):: LLNL-JRNL-741040; BJNEAH

Journal Information:: Beilstein Journal of Nanotechnology, Vol. 9; ISSN 2190-4286

Publisher:: Beilstein InstituteCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 1 work

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References (31)

Vapor-liquid equilibriums of methyl borate-carbon tetrachloride and methyl borate-benzene systems Plank, Charles A.; Christopher, Phoebus M. Journal of Chemical & Engineering Data, Vol. 21, Issue 2 https://doi.org/10.1021/je60069a024	journal	April 1976
Superconductivity at 39 K in magnesium diboride Nagamatsu, Jun; Nakagawa, Norimasa; Muranaka, Takahiro Nature, Vol. 410, Issue 6824 https://doi.org/10.1038/35065039	journal	March 2001
Boron-doped Homoepitaxial Diamond CVD from Microwave Plasma-Activated Ethanol/Trimethyl Borate/Hydrogen Mixtures Belousov, Maxim E.; Mankelevich, Yuri A.; Minakov, Pavel V. Chemical Vapor Deposition, Vol. 18, Issue 10-12 https://doi.org/10.1002/cvde.201206993	journal	September 2012
Thermal-heating CVD synthesis of BN nanotubes from trimethyl borate and nitrogen gas Lin, Feng-Huei; Hsu, Chung-King; Tang, Tzu-Piao Materials Chemistry and Physics, Vol. 107, Issue 1 https://doi.org/10.1016/j.matchemphys.2007.06.053	journal	January 2008
Role of Activated Chemisorption in Gas-Mediated Electron Beam Induced Deposition Bishop, James; Lobo, Charlene J.; Martin, Aiden Physical Review Letters, Vol. 109, Issue 14 https://doi.org/10.1103/PhysRevLett.109.146103	journal	October 2012
Gas-assisted focused electron beam and ion beam processing and fabrication Utke, Ivo; Hoffmann, Patrik; Melngailis, John Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 26, Issue 4 https://doi.org/10.1116/1.2955728	journal	January 2008
The sources of electron-induced contamination in kinetic vacuum systems Ennos, A. E. British Journal of Applied Physics, Vol. 5, Issue 1 https://doi.org/10.1088/0508-3443/5/1/307	journal	January 1954
Formation of Thin Polymer Films by Electron Bombardment Christy, Robert W. Journal of Applied Physics, Vol. 31, Issue 9 https://doi.org/10.1063/1.1735915	journal	September 1960
Continuum models of focused electron beam induced processing Toth, Milos; Lobo, Charlene; Friedli, Vinzenz Beilstein Journal of Nanotechnology, Vol. 6 https://doi.org/10.3762/bjnano.6.157	journal	January 2015
The use of laser scanning confocal microscopy (LSCM) in materials science: USE OF LSCM IN MATERIALS SCIENCE Hovis, D. B.; Heuer, A. H. Journal of Microscopy, Vol. 240, Issue 3 https://doi.org/10.1111/j.1365-2818.2010.03399.x	journal	August 2010
Formation of Boron-Based Films and Boron Nitride Layers by CVD of a Boron Ester Sachdev, Hermann; Müller, Frank; Hüfner, Stefan Angewandte Chemie, Vol. 123, Issue 16 https://doi.org/10.1002/ange.201003012	journal	March 2011
Mechanistic studies of dielectric thin film growth by low pressure chemical vapor deposition: The reaction of tetraethoxysilane with SiO ₂ surfaces Tedder, Laura L.; Lu, Guangquan; Crowell, John E. Journal of Applied Physics, Vol. 69, Issue 10 https://doi.org/10.1063/1.348932	journal	May 1991
Simulation-Guided 3D Nanomanufacturing via Focused Electron Beam Induced Deposition Fowlkes, Jason D.; Winkler, Robert; Lewis, Brett B. ACS Nano, Vol. 10, Issue 6 https://doi.org/10.1021/acsnano.6b02108	journal	May 2016
Damage-free mask repair using electron-beam-induced chemical reactions Liang, Ted; Stivers, Alan R. Emerging Lithographic Technologies VI https://doi.org/10.1117/12.472312	conference	July 2002
The chemical vapor deposition of SiO ₂ from tetraethoxysilane: The effect of the surface hydroxyl concentration Tedder, Laura L.; Crowell, John E.; Logan, Mark A. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 9, Issue 3 https://doi.org/10.1116/1.577566	journal	May 1991
Structure and composition studies of chemical vapour-deposited BCN fibre coatings Dietrich, Dagmar; Roll, Ulrich; Stöckel, Sabine Analytical and Bioanalytical Chemistry, Vol. 374, Issue 4 https://doi.org/10.1007/s00216-002-1452-2	journal	October 2002
Comparison of boranol and silanol reactivities in boron‐doped SiO ₂ chemical vapor deposition from trimethyl borate and tetraethyl orthosilicate Bartram, M. E.; Moffat, H. K. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 12, Issue 4 https://doi.org/10.1116/1.579279	journal	July 1994
Synthesis and characterization of BN thin films prepared by plasma MOCVD with organoboron precursors Yasui, Haruyuki; Awazu, Kaoru; Ikenaga, Noriaki Vacuum, Vol. 83, Issue 3 https://doi.org/10.1016/j.vacuum.2008.04.030	journal	October 2008
Cryogenic Electron Beam Induced Chemical Etching Martin, Aiden A.; Toth, Milos ACS Applied Materials & Interfaces, Vol. 6, Issue 21 https://doi.org/10.1021/am506163w	journal	October 2014
Electron beam induced chemical dry etching and imaging in gaseous NH ₃ environments Lobo, Charlene J.; Martin, Aiden; Phillips, Matthew R. Nanotechnology, Vol. 23, Issue 37 https://doi.org/10.1088/0957-4484/23/37/375302	journal	August 2012
Simulating the effects of surface diffusion on electron beam induced deposition via a three-dimensional Monte Carlo simulation Smith, Daryl A.; Fowlkes, Jason D.; Rack, Philip D. Nanotechnology, Vol. 19, Issue 41 https://doi.org/10.1088/0957-4484/19/41/415704	journal	September 2008
Formation of Boron-Based Films and Boron Nitride Layers by CVD of a Boron Ester Sachdev, Hermann; Müller, Frank; Hüfner, Stefan Angewandte Chemie International Edition, Vol. 50, Issue 16 https://doi.org/10.1002/anie.201003012	journal	March 2011
Formulation of a universal electron probe microanalysis correction method Scott, V. D.; Love, G. X-Ray Spectrometry, Vol. 21, Issue 1 https://doi.org/10.1002/xrs.1300210109	journal	January 1992
Evaluation of B ₄ C as an Ablator Material for NIF Capsules Burnham, Alan K.; Alford, Craig S.; Makowiecki, Daniel M. Fusion Technology, Vol. 31, Issue 4 https://doi.org/10.13182/FST97-A30801	journal	July 1997
Direct-Write 3D Nanoprinting of Plasmonic Structures Winkler, Robert; Schmidt, Franz-Philipp; Haselmann, Ulrich ACS Applied Materials & Interfaces, Vol. 9, Issue 9 https://doi.org/10.1021/acsami.6b13062	journal	December 2016
B/Si multilayers for soft x-ray and extreme ultraviolet optics Ravet, M. F.; Bridou, F.; Raynal, A. Journal of Applied Physics, Vol. 89, Issue 2 https://doi.org/10.1063/1.1322590	journal	January 2001
Direct Electron Beam Writing of Silver-Based Nanostructures Höflich, Katja; Jurczyk, Jakub; Zhang, Yucheng ACS Applied Materials & Interfaces, Vol. 9, Issue 28 https://doi.org/10.1021/acsami.7b04353	journal	July 2017
The chemical vapor deposition of SiO2 from teos Crowell, John E.; Tedder, Laura L.; Cho, Hee-Chuen Journal of Electron Spectroscopy and Related Phenomena, Vol. 54-55 https://doi.org/10.1016/0368-2048(90)80299-P	journal	January 1990
Effect of bias on neutron detection in thin semiconducting boron carbide films Day, E.; Diaz, M. J.; Adenwalla, S. Journal of Physics D: Applied Physics, Vol. 39, Issue 14 https://doi.org/10.1088/0022-3727/39/14/007	journal	June 2006
The Viscosity and Thermal Stability of Vapor of Trimethyl Borate Makishima, Shoji; Yoneda, Yukio; Tajima, Tatsuya The Journal of Physical Chemistry, Vol. 61, Issue 12 https://doi.org/10.1021/j150558a010	journal	December 1957
MEMS Mechanical Sensors Beeby, S. P. Sensor Review, Vol. 24, Issue 3 https://doi.org/10.1108/sr.2004.24.3.319.2	journal	September 2004

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