X-ray reflectivity measurement of interdiffusion in metallic multilayers during rapid heating

Liu, J. P.; Kirchhoff, J.; Zhou, L.; Zhao, M.; Grapes, M. D.; Dale, D. S.; Tate, M. D.; Philipp, H. T.; Gruner, S. M.; Weihs, T. P.; Hufnagel, T. C.

doi:10.1107/S1600577517008013

Title: X-ray reflectivity measurement of interdiffusion in metallic multilayers during rapid heating

Journal Article · Thu Jun 15 00:00:00 EDT 2017 · Journal of Synchrotron Radiation (Online)

DOI:https://doi.org/10.1107/S1600577517008013· OSTI ID:1426777

Liu, J. P. ^[1]; Kirchhoff, J. ^[2]; Zhou, L. ^[2]; Zhao, M. ^[2]; Grapes, M. D. ^[2]; Dale, D. S. ^[3]; Tate, M. D. ^[4]; Philipp, H. T. ^[4]; Gruner, S. M. ^[5]; Weihs, T. P. ^[2]; Hufnagel, T. C. ^[2]

Johns Hopkins Univ., Baltimore, MD (United States); Beijing Inst. of Technology, Beijing (China)
Johns Hopkins Univ., Baltimore, MD (United States)
Cornell Univ., Ithaca, NY (United States). Cornell High Energy Synchrotron Source (CHESS)
Cornell Univ., Ithaca, NY (United States)
Cornell Univ., Ithaca, NY (United States). Cornell High Energy Synchrotron Source (CHESS); Cornell Univ., Ithaca, NY (United States); Cornell Univ., Ithaca, NY (United States). Kavli Inst. at Cornell for Nanoscale Science

A technique for measuring interdiffusion in multilayer materials during rapid heating using X-ray reflectivity is described. In this technique the sample is bent to achieve a range of incident angles simultaneously, and the scattered intensity is recorded on a fast high-dynamic-range mixed-mode pixel array detector. Heating of the multilayer is achieved by electrical resistive heating of the silicon substrate, monitored by an infrared pyrometer. As an example, reflectivity data from Al/Ni heated at rates up to 200 K s^-1 are presented. At short times the interdiffusion coefficient can be determined from the rate of decay of the reflectivity peaks, and it is shown that the activation energy for interdiffusion is consistent with a grain boundary diffusion mechanism. At longer times the simple analysis no longer applies because the evolution of the reflectivity pattern is complicated by other processes, such as nucleation and growth of intermetallic phases.

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Research Organization:: Johns Hopkins Univ., Baltimore, MD (United States)

Sponsoring Organization:: USDOE

Grant/Contract Number:: SC0016035

OSTI ID:: 1426777

Journal Information:: Journal of Synchrotron Radiation (Online), Vol. 24, Issue 4; ISSN 1600-5775

Publisher:: International Union of CrystallographyCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 14 works

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Quick X-ray Reflectivity using Monochromatic Synchrotron Radiation for Time-Resolved Applications Joress, H.; Brock, J. D.; Woll, A. R. arXiv https://doi.org/10.48550/arxiv.1711.03183	text	January 2017

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