Mechanistic studies of palladium deposition from palladium bis(hexafluoroacetylacetonate) on copper surfaces under ultrahigh vacuum
- Univ. of Illinois, Urbana-Champaign, IL (United States)
The authors have recently shown that palladium bis-(hexafluoroacetylacetonate) selectively deposits palladium films on copper and iron substrates via unique surface redox transmetallation reactions. This paper will present detailed mechanistic studies of the reactions of Pd(hfac){sub 2} on copper surfaces under ultrahigh vacuum (UHV) conditions by using temperature programmed reaction (TPR), integrated desorption mass spectrometric (IDMS), reactive scattering, in-situ X-ray photo-electron spectroscopic (XPS), and reflection-adsorption infrared spectroscopic (RAIR) methods. Temperature programmed reaction (TPR) shows that Pd(hfac){sub 2} does not react with clean copper surface to give Cu(hfac){sub 2} in UHV; instead hfac ligands decompose to give desorption features at 500K-650K for CF{sub 3}COCC, CF{sub 3}COF, CF{sub 3}CO, CF{sub 3}, CO{sub 2}, and CO species. In contrast, Pd(hfac){sub 2} does react with copper to give Cu(hfac){sub 2} on {open_quotes}pretreated{close_quotes} copper surfaces. Reactive scattering of Pd(hfac){sub 2} on copper surfaces suggests that the redox transmetallation reaction occurs with extremely high efficiency under constant Pd(hfac){sub 2} flux at temperatures higher than 400 K. In situ XPS studies show that the formation of Cu(hfac){sub 2} on clean and {open_quotes}pretreated{close_quotes} copper surfaces can be correlated with different orientations of the hfac groups.
- OSTI ID:
- 141049
- Report Number(s):
- CONF-930304-; TRN: 93:003688-0722
- Resource Relation:
- Conference: 205. American Chemical Society national meeting, Denver, CO (United States), 28 Mar - 2 Apr 1993; Other Information: PBD: 1993; Related Information: Is Part Of 205th ACS national meeting; PB: 1951 p.
- Country of Publication:
- United States
- Language:
- English
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