Toward Ultraflat Surface Morphologies During Focused Electron Beam Induced Nanosynthesis: Disruption Origins and Compensation
- Graz Centre for Electron Microscopy, Graz (Austria)
- EMPA, Swiss Federal Laboratories for Materials Science and Technology, Thun (Switzerland); AGH University of Science and Technology, Krakow (Poland)
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Science (CNMS); Univ. of Tennessee, Knoxville, TN (United States)
- EMPA, Swiss Federal Laboratories for Materials Science and Technology, Thun (Switzerland)
- Graz Centre for Electron Microscopy, Graz (Austria); Graz University of Technology, Graz (Austria)
Here we explore emerging applications for nanoscale materials demand precise deposit shape retention from design to deposition. This study investigates the effects that disrupt high-fidelity shapes during focused electron beam induced nanosynthesis. It is shown that process parameters, patterning strategies and deposit topography can impose lateral precursor coverage gradients during growth resulting in unwanted topographic artifacts. The study classifies the evolving surface shapes into four general types and explains the formation and transition from a fundamental point of view. Continuum model calculations and simulations expand the experimental results to provide a comprehensive insight into understand the disruption mechanism. The findings demonstrate that the well-established concept of growth regimes has to be expanded by its lateral gradients as they strongly influence final shape fidelities. Finally, the study is complemented by a compensation strategy that improves the edge fidelity on the lower nanoscale to further push this technique toward the intrinsic limitations.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- AC05-00OR22725
- OSTI ID:
- 1265379
- Journal Information:
- ACS Applied Materials and Interfaces, Vol. 7, Issue 5; ISSN 1944-8244
- Publisher:
- American Chemical Society (ACS)
- Country of Publication:
- United States
- Language:
- English
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